• Laboratory Compact Hot Plate ASP-HP10 for Photolithography
    Laboratory Compact Hot Plate ASP-HP10 for Photolithography Laboratory Compact Hot Plate ASP-HP10 for Photolithography Laboratory Compact Hot Plate ASP-HP10 for Photolithography

  • ASP-HP10 is a compact and easy-to-use hot plate designed for general lab uses, especially for photolithography process.  It features high temperature control accuracy and uniformity. It can be placed into a glovebox for semiconductor industry users. 



Key Features 

  • Heating surface is made of oxidized Aluminum (excellent corrosion resistance) 
  • Stainless steel chassis
  • High uniformity of control temperature
  • High-precision digital display temperature control table control, ±1°C
  • Independent heating circuit control for heating output 
  • Separated heating element and control components, ensuring safety;
  • Temperature can reach 300 °C
  • Heating plate size can be customized 
  • 2-year limited warranty 

    Typical Applications

    • Semiconductor process
    • Patterning,
    • Coating process
    • Photolithography
    • Glovebox



    Product  ModelASP-HP10
    Plate Working Area220 mm x 220 mm
    Temperature RangeRoom Temp -300 °C 
    Temperature Resolution0.1°C 
    Temperature Precision± 1 °C 
    Temperature Uniformity<±2%
    Power /Current110-220VAC, 50/60Hz, 5A
    Heating Power1000 W
    Equipment Dimension256 mm x 230 mm x 230mm


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    Laboratory Compact Hot Plate ASP-HP10 for Photolithography

    • $2,018.00


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    Tags: Semiconductor, Coating, UV Curing, Glovebox, Photolithography, Peristaltic Pump