• Laboratory Programmable Benchtop Spin Coater ASP-200SE Model Including Oil-Free Vacuum Pump, 110/230VAC
    Laboratory Programmable Benchtop Spin Coater ASP-200SE Model Including Oil-Free Vacuum Pump, 110/230VAC Laboratory Programmable Benchtop Spin Coater ASP-200SE Model Including Oil-Free Vacuum Pump, 110/230VAC Laboratory Programmable Benchtop Spin Coater ASP-200SE Model Including Oil-Free Vacuum Pump, 110/230VAC Laboratory Programmable Benchtop Spin Coater ASP-200SE Model Including Oil-Free Vacuum Pump, 110/230VAC Laboratory Programmable Benchtop Spin Coater ASP-200SE Model Including Oil-Free Vacuum Pump, 110/230VAC

This product AC200SE  is a cost-effective benchtop vacuum spin coater designed for precise and uniform deposition of thin films and coatings.   The vibration-free and portable design makes it a versatile tool for either R&D or development uses.  For example, it can be installed in a glovebox or in a fume food.   It carries with a oil-free vacuum pump with low noises.  This spin coater can be used to deposit metal oxide thin films, polymer coatings and metal organic thin films.   The standard spin bowl is made of HDPE.  Three pieces of standard vacuum chunks (Diameter: 10mm, 25mm and 55mm) come with this spin coater. 


Key Features 

General Design Feature

  • Easy to clean the spin bowl which is removable  
  • 7'' touchscreen intuitive graphic user interface
  • Wafer size: 10mm to 8'' (200mm) 
  • Anti-blockage spindle design for easy maintenance
  • Easy access to dynamic and static dispenser 

Chemical resistant materials for safe and reliable uses 

  • Stainless steel material of the equipment main body
  • Spin bowl made of standard HDPE 
  • Transparent spin lid is solvent resistant 
  • Vacuum interlock

Programable Mode

  • Intuitive LCD screen 
  • Up to 100 user-defined spin programs and up to 100 spin steps per program
  • User can save and restore spin parameters 
  • Wide range of spin speed and increased spin resolution  (100-12,000 RPM)

Typical Applications

  • Semiconductor process
  • Patterning,
  • Coating process
  • Photolithography 


Spin Coater
Chamber Size 210 mm (HDPE Material)
Max Wafer Size 8 Inches (200mm)
Vacuum Chuck 3 Pieces Vacuum chunk. Diameter: 10mm, 25mm and 55mm
Spin Speed 100-12,000 RPM (0-50,000 RPM/sec)
Spin Control Programmable Mode; 100 programmable recipes and restore
Spin Control Resolution 1 RPM
Equipment Power 110-230VAC, 50/60Hz (200W)
Equipment Dimension 433 mm (L) x 306 mm(W) x 306 mm)H)

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Laboratory Programmable Benchtop Spin Coater ASP-200SE Model Including Oil-Free Vacuum Pump, 110/230VAC

  • $9,899.00


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Tags: Semiconductor, Coating, UV Curing, Glovebox, Photolithography, Peristaltic Pump