KW-4A is a compact and easy-to-use spin coater for precise and uniform deposition of thin films and coatings. Its rugged, vibration-free and portable design makes it a versatile tool for your research facility. A two-stage spin process allows dispensing at low speed and homogenizing the coating at high speed. The KW-4A spin coater can be used to deposit metal oxide thin films, polymer coatings and metal organic thin films. This product features a Teflon-coated stainless steel coating bowl with a 2inch diameter CG type aluminum vacuum chuck.
Key Features
- Digital Readout in Speed 1,000 rpm
- Stage 1: 500-2,500 rpm
- Timer: 2-18 seconds
- Stage II: 1,000-8,000 rpm
- Timer: 3-60 seconds
- Power: 115-220VAC, 50/60HZ
- Vacuum: 2.1 CFM
- Speed stability: <1%
- Coating uniformity: <3%
Typical Applications
- Semiconductor process
- Patterning,
- Coating process
The next smaller size chuck that is just smaller than your largest substrate is recommended. There should be no exposed chuck surface, otherwise, the coating liquid will be sucked away into the vacuum holding system. The vacuum chucks are available in Aluminum and PTFE with different sizes. See the options.
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Spin Coater KW-4A User Manual.pdf File Size 168.8KB |
CHEMAT 2-Stage Spin Coater KW-4A, 110-230VAC for Photolithography
- Brand: CHEMAT Scientific
- Product Code: ASP-KW-4A
- Availability: In Stock
-
$3,750.00
Available Options
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Tags: Fluid Handling, UV Curing, Photolithography, Semiconductor, Glovebox, Peristaltic Pump