This product is a cost-effective compact size vacuum spin coater designed for precise and uniform deposition of thin films and coatings. The vibration-free and portable design makes it a versatile tool for either R&D or development uses. For example, it can be installed in a glovebox or in a fume food. It carries with a oil-free vacuum pump with low noises. This spin coater can be used to deposit metal oxide thin films, polymer coatings and metal organic thin films.
Key Features
General Design Feature
- 5 Spin programs with 5 steps for each program
- Wafer size: 10 mm to 4'' (100 mm)
- Anodic oxidation aluminum shell
- Anti-blockage spindle design for easy maintenance
- Easy to clean the spin bowl which is removable
Safety and Reliability
- Compact size
- Vacuum interlock
- Hinged spin bowl lid design
Chemical Compatibility
- Removable spin bowl
- Solvent resistant transparent lid
- Chemical resistant spin bowl
Programable Mode
- Intuitive LCD screen
- Can program up to 5 recipes and 5 steps each recipe
Package includes
- Vacuum chuck kit (10mm, 25mm and 55mm)
- Oil-free vacuum pump
- Other accessories
Typical Applications
- Semiconductor process
- Patterning,
- Coating process
- Photolithography
| Spin Coater | |
| Chamber Size | 135mm |
| Max Wafer Size | 4 inches (100mm) |
| Vacuum Chuck | 3 Pieces included (Diameter: 8 mm; 15mm; and 55mm) |
| Spin Speed | 100-9999 RPM |
| Spin Control | Programmable Control (5 modes) and Recipe Restore |
| Spin Control Resolution | 1 RPM |
| Equipment Power | 110-230VAC, 50/60Hz |
| Equipment Dimension | 250 mm (L) x 210 mm(W) x 200 mm (H) |
Laboratory Programmable Compact Spin Coater EZ4S Model Including Oil-Free Vacuum Pump, 110/230VAC
- Brand: Aurora Pro Scientific
- Product Code: ASP-EZ4S
- Availability: In Stock
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$2,498.00
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Tags: Semiconductor, Coating, UV Curing, Glovebox, Photolithography, Peristaltic Pump