This product is a cost-effective compact size vacuum spin coater designed for precise and uniform deposition of thin films and coatings. The vibration-free and portable design makes it a versatile tool for either R&D or development uses. For example, it can be installed in a glovebox or in a fume food. It carries with a oil-free vacuum pump with low noises. This spin coater can be used to deposit metal oxide thin films, polymer coatings and metal organic thin films.
Key Features
General Design Feature
- 5 Spin programs with 5 steps for each program
- Wafer size: 10 mm to 4'' (100 mm)
- Anodic oxidation aluminum shell
- Anti-blockage spindle design for easy maintenance
- Easy to clean the spin bowl which is removable
Safety and Reliability
- Compact size
- Vacuum interlock
- Hinged spin bowl lid design
Chemical Compatibility
- Removable spin bowl
- Solvent resistant transparent lid
- Chemical resistant spin bowl
Programable Mode
- Intuitive LCD screen
- Can program up to 5 recipes and 5 steps each recipe
Typical Applications
- Semiconductor process
- Patterning,
- Coating process
- Photolithography
Spin Coater | |
Chamber Size | 135mm |
Max Wafer Size | 4 inches (100mm) |
Vacuum Chuck | 3 Pieces included (Diameter: 8 mm; 15mm; and 55mm) |
Spin Speed | 100-9999 RPM |
Spin Control | Programmable Control (5 modes) and Recipe Restore |
Spin Control Resolution | 1 RPM |
Equipment Power | 110-230VAC, 50/60Hz |
Equipment Dimension | 250 mm (L) x 210 mm(W) x 200 mm (H) |
Laboratory Programmable Compact Spin Coater EZ4S Model Including Oil-Free Vacuum Pump, 110/230VAC
- Brand: Aurora Pro Scientific
- Product Code: ASP-EZ4S
- Availability: In Stock
- $2,498.00
-
$2,372.00
Related Products
Standard α-1200U Atmospheres Glove Box Separated
Standard models of gloveboxes are complete standalone systems integrated with entire functional co..
$24,500.00
Peristaltic Pump, Flow Rate 150 nL/min - 500 mL/min, Max 8 Channels, Keyboard Control, L100-1S-1
This multi-channel Peristaltic Pump (L100-1S-1) can generate adjustable flow rates in the ran..
$653.00
Diener- Zepto (Low Cost / Low Budget) LOW-PRESSURE PLASMA SYSTEMS (PLASMA CLEANER)
Gas plasma treatment is a proven standard for controlled substrate surface cleaning, adhesion promot..
CHEMAT 2-Stage Spin Coater KW-4A, 110-230VAC for Photolithography
KW-4A is a compact and easy-to-use spin coater for precise and uniform deposition of thin films and ..
$3,500.00
CHEMAT Programmable Spin coater Spin Master 100, Voltage 110/230VAC
CHEMAT Spin Master SP100 is a programmable and easy-to-use spin coater for precise and uniform depos..
$6,999.00
Laboratory Compact Hot Plate ASP-HP10 for Photolithography
ASP-HP10 is a compact and easy-to-use hot plate designed for general lab uses, especially for photol..
$2,018.00
Tags: Semiconductor, Coating, UV Curing, Glovebox, Photolithography, Peristaltic Pump