This cutting-edge spin coater is designed for precision and efficiency in thin-film deposition. With a maximum speed of 8,000 RPM, it ensures rapid and uniform coating for a variety of applications. Capable of handling substrates up to 4" in diameter, it is versatile for both research and industrial needs. A standout feature is the integrated heater, which offers excellent temperature control capability (up to 200 degree C) during the spin coating process. This allows for precise adjustments and a maximum temperature control to meet the specific needs of your coatings.  Additionally, the 7-inch LCD touchscreen simplifies the entire process by allowing for the presetting of coating curves, providing user-friendly control and enhancing overall efficiency.

Key Features:

• Compact size: HDPE polymer chamber, PC transparent cover and aluminum alloy body
  
• Reliable thermal insulation design ensures the safety of motors and components
• Safe voltage heating components ensure safe and reliable operation
• Compatible with automatic dispensers
• Temperature control from room temperature to 200°C with 0.1°C resolution
• Excellent temperature uniformity (<2%)
• Adjustable speed: 100 - 8,000 RPM with 1 RPM resolution
• Adjustable wafer clamps: 10-35mm square wafer or 2" wafer (standard). Other sizes can be customized.

Typical Applications:

• Semiconductor Industry:  Ideal for depositing thin films on semiconductor substrates, contributing to the manufacturing of electronic devices and integrated circuits.
  
• Solar Cell Development:  Facilitates the coating of photoactive layers in solar cell fabrication, enhancing efficiency and performance.
• Optoelectronics:  Supports the production of thin films for optical devices, including LEDs, lasers, and sensors.
• Microelectronics Research:  Essential for research and development in microfabrication processes, ensuring precise and uniform coatings.